TSMC to start using High-NA EUV lithography in 2030 — A10 or A11 technology prime candidates for use
محرر واقع مصر
تومز هاردوير
08 سبتمبر, 2026
TSMC discloses plans to use High-NA EUV lithography in 2030, 6×12-inch photomasks with new scanners in 2033.
